Valtr Miroslav ( search by name in IS MU /auth )

Body na spoluautora Body za publikaci pro MU Odkaz ISVaV
2,01 14,04 Optical Characterization of Ultra-Thin Iron and Iron Oxide Films
14,80 44,41 Tip-sample relaxation as a source of uncertainty in nanoscale scanning probe microscopy measurements
8,04 40,18 Influence of substrate material on plasma indeposition/sputtering reactor: experiment and computer simulation
0,00 0,00 Plasma enhanced CVD of hard DLC/SiOx coatings from methane and hexamethyldisiloxane
0,97 6,81 Influence of Silicon, Oxygen and Nitrogen Upon the Properties of Plasma Deposited Amorphous Diamond-like Carbon Coatings
2,75 8,24 Optical characterization of carbon films prepared by PECVD using ellipsometry and reflectometry
8,71 60,95 Optical Characterization of Ultrananocrystalline Diamond Films
3,15 15,76 Surface morphology of amorphous hydrocarbon thin films deposited in pulsed radiofrequency discharge
3,35 13,42 Characterization of near field optical microscope probes
1,32 5,28 UV light enhanced oxidation of a-C:H thin film in air: A study of thickness reduction
4,68 9,36 Scanning probe microscopy analysis of delaminated thin films
0,00 0,00 Study of thickness reduction of a-C:H thin film under UV light irradiation
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(c) Michal Bulant, 2011