| Body na spoluautora | Body za publikaci pro MU | Odkaz ISVaV | | 14,50 | 43,49 | Modelling of the reactive sputtering process with non-uniform discharge current density and different temperature conditions
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| 0,00 | 0,00 | Modelling of surface processes taking place during reactive magnetron sputtering deposition process with simultaneous adding of hydrogen and oxygen
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| 107,38 | 107,38 | Pressure Effect on the Velocity and Flux Distributions of Sputtered Metal Species in Magnetron Discharge Measured by Space-Resolved Tunable Diode Laser Induced Fluorescence
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| 0,00 | 0,00 | Advanced modeling of reactive sputtering process with non-linear discharge current density
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| 0,00 | 0,00 | Ionization Processes and Plasma Chemistry in Pulsed RF Glow Discharge TOF Mass Spectroscopy for Thin Film Depth Profile Analyses
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| 0,00 | 0,00 | Modeling of Radial Variation of Target Poisoning During Reactive Sputtering Deposition Process
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| 0,00 | 0,00 | Modeling of reactive sputtering process with non-linear discharge current density
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| 0,00 | 0,00 | Role of Neutral Gas Temperature on Hysteresis Behaviour of Reactive Sputtering Deposition Process
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| 0,00 | 0,00 | Model of reactive magnetron sputtering process with non-uniform discharge current density
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(c) Michal Bulant, 2011