| Body na spoluautora | Body za publikaci pro MU | Odkaz ISVaV | | 0,00 | 0,00 | Optimization of UV curing: Effect of wavelength on critical properties of low-k dielectrics
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| 0,00 | 0,00 | Multiplate misalignment artifacts in rotating-complensator ellipsometry: Analysis and data treatment
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| 6,72 | 6,72 | Optical characteristics and UV modification of low-k materials
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| 65,00 | 65,00 | Optical Property Changes in Low-k Films upon Ultraviolet-Assisted Curing
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| 0,00 | 0,00 | Spectroscopic elipsometry and ellipsometric porosimetry studies of CVD low-k dielectric films
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| 1,68 | 6,72 | Frequency- and temperature-dependent conductivity at the metal-insulator transition in phosphorus doped silicon studied by far-infrared ellipsometry
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| 0,00 | 0,00 | Changes of UV Optical Properties of Plasma Damaged Low-k Dielectrics for Sidewall Damage Scatterometry
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| 32,55 | 32,55 | Effect of pressure on efficiency of UV curing of CVD-derived low-k material at different wavelengths
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| 0,00 | 0,00 | Application of UV Irradiation in Removal of Post-etch 193 nm Photoresist
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(c) Michal Bulant, 2011