| Body na spoluautora | Body za publikaci pro MU | Odkaz ISVaV | | 2,83 | 28,25 | Pathways and Mechanisms for Product Release in the Engineered Haloalkane Dehalogenases Explored using Classical and Random Acceleration Molecular Dynamics Simulations.
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| 0,00 | 0,00 | Plasma diagnostics using electron paramagnetic resonance
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| 0,00 | 0,00 | Výzkum a aplikace nízkoteplotního plazmatu na ÚFE PřF MU v Brně
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| 0,00 | 0,00 | Investigation of Neon RF Discharge by Means of Refined Collisional-Radiative model
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| 0,00 | 0,00 | Harmonic analysis of discharge voltages as a tool to control RF sputtering deposition process
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| 0,00 | 0,00 | Higher harmonic frequencies measured in Capacitively Coupled Plasma
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| 0,00 | 0,00 | Is it possible to control degree of target poisoning during RF reactive magnetron sputtering by higher harmonic frequencies of discharge voltage?
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| 0,00 | 0,00 | Higher harmonic frequencies of discharge voltages as extremely sensitive marker of state of RF reactive sputtering deposition process
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| 33,21 | 66,41 | Harmonic analysis of discharge voltages as a tool to control the RF sputtering deposition process
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| 0,00 | 0,00 | Higher harmonics of plasma potential in capacitively coupled discharges
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| 0,00 | 0,00 | Influence of silicon, oxygen and nitrogen admixtures on the properies of plasma deposited amorphous diamond-like carbon coating
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| 0,00 | 0,00 | Spatially resolved probe measurements in hydrogen rf discharges
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| 0,00 | 0,00 | Hydrogen line broadening in afterglow observed by means of EPR
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| 0,00 | 0,00 | Energy Spectra of Ions in the Hydrogen Capacitively Coupled Low-Pressure Discharge
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| 2,84 | 11,36 | Energy distribution of hydrogen ions in capacitively coupled low pressure discharge
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| 0,00 | 0,00 | Fourier components of plasma potential in hydrogen capacitively coupled rf discharge
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| 2,27 | 11,36 | Hydrogen Line Broadeninig in Afterglow Observed by Means of EPR
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| 1,65 | 8,24 | Dissociation increase due to admixtures
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| 2,06 | 6,18 | Energy Dependence of the Sensitivity of an Ion Energy and Mass Spectrometer
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| 0,00 | 0,00 | Fast hydrogen ions in capacitively coupled discharge
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| 0,00 | 0,00 | Dissociation Increase Due to Admixtures
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| 0,00 | 0,00 | Influence of Oxygen Admixture on Nitrogen Capacitively Coupled Discharge
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| 2,75 | 8,24 | Influence of methane on the capacitively coupled hydrogen discharge
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| 0,97 | 6,81 | Influence of Silicon, Oxygen and Nitrogen Upon the Properties of Plasma Deposited Amorphous Diamond-like Carbon Coatings
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| 0,00 | 0,00 | Measurement of Fundamental and Higher Harmonic Frequencies as Tool to Control RF Sputtering Deposition Process
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| 0,00 | 0,00 | Radial Structure of RF Discharge in Neon
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| 4,13 | 28,90 | Deposition of protective coatings in rf organosilicon discharges
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| 0,48 | 4,80 | Deposition and Characterization of Nanostructured Silicon-Oxide Containing Diamond-Like Carbon Coatings
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| 0,00 | 0,00 | Hydrogen dissociation degree in capacitively coupled discharge
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| 0,00 | 0,00 | Influence of methane on capacitively coupled oxygen discharge
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| 0,00 | 0,00 | DEPENDENCE OF HIGHER HARMONIC FREQUENCIES MEASURED IN CAPACITIVELY COUPLED PLASMA ON THE MATCHING UNIT PARAMETERS
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| 0,00 | 0,00 | Measurement of ions in H2 - N2 capacitively coupled discharge
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| 0,00 | 0,00 | Sheath resistance in RF discharges
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| 0,00 | 0,00 | Silicon-oxide Containing Diamond-like Carbon Coatings Prepared Using Plasma Enhanced Chemical Vapor Deposition
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(c) Michal Bulant, 2011