| Body na spoluautora | Body za publikaci pro MU | Odkaz ISVaV | | 8,04 | 40,18 | Influence of substrate material on plasma indeposition/sputtering reactor: experiment and computer simulation
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| 0,00 | 0,00 | The Role of Secondary Electrons in Low Pressure rf Glow Discharge
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| 0,00 | 0,00 | The Role of Secondary Electrons in Low Pressure RF Discharge via Computer Simulation
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| 0,00 | 0,00 | Modelování dohasínajícího plazmatu
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| 4,12 | 8,24 | Influence of the Ramsauer minimum on the plasma characteristics studied via computer simulation
|
| 0,00 | 0,00 | Determination of electron temperature in neon RF discharge by means of collisional-radiative model
|
| 0,00 | 0,00 | Determination of electron density in RF discharge in neon by emission spectroscopy complemented with C-R model and PIC/MC simulation
|
| 0,00 | 0,00 | Study of Attachment and Detachment Reactions in Flowing Afterglow via Computer Simulation
|
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(c) Michal Bulant, 2011